Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10928721 | Reflective mask blank for EUV lithography | — | 2021-02-23 |
| 9739722 | Reflective mask blank for EUV lithography, and process for its inspection and process for its production | Hiroshi Nakanishi, Junichi Kageyama | 2017-08-22 |
| 9268207 | Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof | — | 2016-02-23 |
| 9120842 | SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same | Yasuharu Nishimura, Shuichi Nakatsuru | 2015-09-01 |
| 8993201 | Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate | Masaki Mikami, Mitsuhiko Komakine | 2015-03-31 |
| 8921017 | Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate | Yuzo Okamura | 2014-12-30 |
| 8916316 | Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank | Yuzo Okamura | 2014-12-23 |
| 8580465 | Multilayer mirror for EUV lithography and process for its production | Masaki Mikami, Mitsuhiko Komakine | 2013-11-12 |
| 8518613 | Optical member base material for EUV lithography, and method for producing same | Hiroshi Nakanishi | 2013-08-27 |
| 8470968 | SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same | Yasuharu Nishimura, Shuichi Nakatsuru | 2013-06-25 |
| 8402786 | Synthetic silica glass optical component and process for its production | Shinya Kikugawa, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa | 2013-03-26 |
| 8251197 | Banknote deposit machine, processing system and method | Hisashi Takeuchi, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako | 2012-08-28 |
| 8241821 | Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography | — | 2012-08-14 |
| 8206510 | Method and apparatus for an in-situ ultraviolet cleaning tool | Abbas Rastegar | 2012-06-26 |
| 8053557 | SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same | Yasuharu Nishimura, Shuichi Nakatsuru | 2011-11-08 |
| 8052797 | Method for removing foreign matter from substrate surface | — | 2011-11-08 |
| 8017345 | Diagnostic kit for malignant melanoma | Yasuharu Nishimura, Tetsuya Nakatsura | 2011-09-13 |
| 7960077 | Reflective-type mask blank for EUV lithography | Toshiyuki Uno, Ken Ebihara | 2011-06-14 |
| 7921859 | Method and apparatus for an in-situ ultraviolet cleaning tool | Abbas Rastegar | 2011-04-12 |
| 7901843 | Process for smoothing surface of glass substrate | Takashi Sugiyama, Masabumi Ito | 2011-03-08 |
| 7784307 | Optical member made of synthetic quartz glass, and process for its production | Tomonori Ogawa, Shinya Kikugawa | 2010-08-31 |
| 7712333 | Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography | Toshiyuki Uno, Mika Yokoyama, Ken Ebihara | 2010-05-11 |
| 7694797 | Printed note processing machine and system | Hisashi Takeuchi, Masao Sakamoto, Hirokazu Goto, Masaru Hayasako | 2010-04-13 |
| 7678511 | Reflective-type mask blank for EUV lithography | Toshiyuki Uno, Ken Ebihara | 2010-03-16 |
| 7592063 | Quartz glass substrate and process for its production | Shinya Kikugawa | 2009-09-22 |