Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12415762 | Method of producing SiC—Si composite component and SiC—Si composite component | Kenji Yamada, Kenichiro Terada, Nobuhiro Shinohara, Yasuo Shinozaki, Shunsuke SUSA | 2025-09-16 |
| 10731233 | Composition for bonding | Minoru Yamada, Atsushi Yamada, Koichi Shibuya, Keisuke Hanashima | 2020-08-04 |
| 8402786 | Synthetic silica glass optical component and process for its production | Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa | 2013-03-26 |
| 8323856 | Mask blanks | Akira Takada, Satoru Takaki, Yosuke Sato, Yasuhiko Akao | 2012-12-04 |
| 8257675 | Artificial quartz member, process for producing the same, and optical element comprising the same | Noriyuki Agata, Yutaka Shimizu, Kazumi Yoshida, Masatoshi Nishimoto | 2012-09-04 |
| 8178450 | TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture | Akio Koike, Kenta Saito, Long Shao, Yasutomi Iwahashi | 2012-05-15 |
| 8093165 | TiO2-containing silica glass and optical member for EUV lithography using the same | Akio Koike, Yasutomi Iwahashi, Yuko Tachibana | 2012-01-10 |
| 8034731 | TIO2-containing silica glass and optical member for lithography using the same | Akio Koike, Yasutomi Iwahashi | 2011-10-11 |
| 7998892 | TiO2-containing silica glass and optical member for lithography using the same | Akio Koike, Yasutomi Iwahashi | 2011-08-16 |
| 7989378 | TiO2-containing silica glass | Akio Koike, Yasutomi Iwahashi | 2011-08-02 |
| 7784307 | Optical member made of synthetic quartz glass, and process for its production | Tomonori Ogawa, Yoshiaki Ikuta | 2010-08-31 |
| 7592063 | Quartz glass substrate and process for its production | Yoshiaki Ikuta | 2009-09-22 |
| 7585800 | Silica glass and optical material | Mitsuhiro Kawata, Akira Takada, Hideaki Hayashi, Naoki Sugimoto | 2009-09-08 |
| 7491475 | Photomask substrate made of synthetic quartz glass and photomask | Keigo Hino, Hitoshi Mishiro | 2009-02-17 |
| 7419924 | Silica glass containing TiO2 and process for its production | Akio Koike, Yasutomi Iwahashi, Yasuyuki Takimoto | 2008-09-02 |
| 7022633 | Synthetic quartz glass and process for producing it | Yoshiaki Ikuta, Noriaki Shimodaira, Akio Masui, Shuhei Yoshizawa | 2006-04-04 |
| 6829084 | Ultraviolet and vacuum ultraviolet antireflection substrate | Satoru Takaki, Kaname Okada | 2004-12-07 |
| 6795170 | Structure for attaching a pellicle to a photo-mask | Hitoshi Mishiro, Kaname Okada, Takayuki Kawahara, Morio Terakado | 2004-09-21 |
| 6744562 | Pellicle | Kaname Okada | 2004-06-01 |
| 6713200 | Pellicle and method of using the same | Hiroshi Arishima, Hitoshi Mishiro | 2004-03-30 |
| 6628456 | Ultraviolet and vacuum ultraviolet antireflection substrate | Satoru Takaki, Kaname Okada | 2003-09-30 |
| 6611317 | Exposure apparatus, semiconductor device, and photomask | Tohru Ogawa, Hideo Hosono, Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira +1 more | 2003-08-26 |
| 6576578 | Synthetic quartz glass and method for preparing the same | Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa | 2003-06-10 |
| 6544914 | Synthetic quartz glass for optical member, process for producing the same, and method of using the same | Yoshiaki Ikuta, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa | 2003-04-08 |
| 6499317 | Synthetic quartz glass and method for production thereof | Yoshiaki Ikuta, Noriaki Shimodaira, Akio Masui, Shuhei Yoshizawa | 2002-12-31 |