Issued Patents 2024
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12176190 | Arc management algorithm of RF generator and match box for CCP plasma chambers | Tiefeng Shi, Gang Fu | 2024-12-24 |
| 12104347 | Coupler | Gary Miller, Gavin Urwin, Chris Bradley, Chris LEWIS, Howard Reay | 2024-10-01 |
| 12094699 | Methods and apparatus for controlling ion fraction in physical vapor deposition processes | Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, William Fruchterman +4 more | 2024-09-17 |
| D1037954 | Self-retained low friction pad | Ilya Lavitsky | 2024-08-06 |
| 12027354 | Cleaning of SIN with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Tza-Jing Gung, Xianmin Tang +4 more | 2024-07-02 |
| 12018361 | Waveform shape factor for pulsed PVD power | Shouyin Zhang | 2024-06-25 |
| 12014906 | High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber | William Johanson, Cheng-Hsiung Tsai, John C. Forster, Mukund Sundararajan | 2024-06-18 |
| D1026054 | Collimator for a physical vapor deposition (PVD) chamber | Martin Lee Riker, Luke Vianney Varkey, Xiangjin Xie, Kishor Kalathiparambil | 2024-05-07 |
| 11915918 | Cleaning of sin with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Tza-Jing Gung, Xianmin Tang +4 more | 2024-02-27 |
| 11898236 | Methods and apparatus for processing a substrate | Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi +9 more | 2024-02-13 |
| 11868147 | Optical emission spectroscopy control of gas flow in processing chambers | Philip DiGiacomo, Sunil Kumar Garg, Paul Kiely, Rajat Agrawal | 2024-01-09 |
| D1009816 | Collimator for a physical vapor deposition chamber | Martin Lee Riker, Fuhong Zhang, Luke Vianney Varkey, Kishor Kalathiparambil, Xiangjin Xie | 2024-01-02 |