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Dual contact process with stacked metal layers |
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Integrated circuit interconnect structures with ultra-thin metal chalcogenide barrier materials |
Carl Naylor |
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| 12033896 |
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| 12027458 |
Subtractively patterned interconnect structures for integrated circuits |
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| 11888034 |
Transistors with metal chalcogenide channel materials |
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| 11869894 |
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Cobalt based interconnects and methods of fabrication thereof |
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