Issued Patents 2022
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11479856 | Multi-cycle ALD process for film uniformity and thickness profile modulation | Purushottam Kumar, Hu Kang, Jun Qian, Tuan Nguyen, Ye Wang | 2022-10-25 |
| 11443975 | Planar substrate edge contact with open volume equalization pathways and side containment | Patrick Breiling, Ramesh Chandrasekharan, Karl Leeser, Paul Konkola, Chloe Baldasseroni +7 more | 2022-09-13 |
| 11434567 | Substrate processing system with tandem source activation for CVD | Hu Kang, Karl Leeser | 2022-09-06 |
| 11373862 | Surface modified depth controlled deposition for plasma based deposition | Joseph R. Abel, Purushottam Kumar | 2022-06-28 |
| 11332824 | Systems and methods for reducing effluent build-up in a pumping exhaust system | Antonio Xavier, Steven Goza, Ramesh Chandrasekharan, Joseph Nesmith | 2022-05-17 |
| 11322416 | Controller for controlling core critical dimension variation using flash trim sequence | Pulkit Agarwal, Ravi Kumar, Purushottam Kumar | 2022-05-03 |
| 11293098 | Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching | Joseph R. Abel, Purushottam Kumar, Bart J. van Schravendijk | 2022-04-05 |
| 11255017 | Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system | Jun Qian, Purushottam Kumar, You Zhai, Jeremiah Baldwin, Sung Je Kim | 2022-02-22 |