Issued Patents 2022
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11479856 | Multi-cycle ALD process for film uniformity and thickness profile modulation | Adrien LaVoie, Hu Kang, Jun Qian, Tuan Nguyen, Ye Wang | 2022-10-25 |
| 11373862 | Surface modified depth controlled deposition for plasma based deposition | Joseph R. Abel, Adrien LaVoie | 2022-06-28 |
| 11322416 | Controller for controlling core critical dimension variation using flash trim sequence | Pulkit Agarwal, Adrien LaVoie, Ravi Kumar | 2022-05-03 |
| 11293098 | Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching | Joseph R. Abel, Bart J. van Schravendijk, Adrien LaVoie | 2022-04-05 |
| 11255017 | Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system | Jun Qian, Adrien LaVoie, You Zhai, Jeremiah Baldwin, Sung Je Kim | 2022-02-22 |