Issued Patents 2022
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11527421 | Gas delivery system for high pressure processing chamber | Srinivas D. Nemani, Sean S. Kang, Adib Khan, Ellie Yieh | 2022-12-13 |
| 11408075 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Jang-Gyoo Yang, Nitin K. Ingle | 2022-08-09 |
| 11387071 | Multi-source ion beam etch system | Srinivas D. Nemani, Ellie Yieh, Douglas A. Buchberger, Jr., Chentsau Chris Ying | 2022-07-12 |
| 11361978 | Gas delivery module | Adib Khan, Sultan Malik, Srinivas D. Nemani | 2022-06-14 |
| 11289331 | Methods for graphene formation using microwave surface-wave plasma on dielectric materials | Jie Zhou, Erica Chen, Chentsau Chris Ying, Srinivas D. Nemani, Ellie Yieh | 2022-03-29 |
| 11264213 | Chemical control features in wafer process equipment | Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2022-03-01 |
| 11250259 | Blending of agricultural products via hyperspectral imaging and analysis | Seetharama C. Deevi, Henry M. Dante, Samuel Timothy Henry | 2022-02-15 |
| 11244808 | Monopole antenna array source for semiconductor process equipment | Srinivas D. Nemani | 2022-02-08 |
| D941787 | Substrate transfer blade | Sultan Malik, Srinivas D. Nemani, Adib Khan | 2022-01-25 |
| 11222769 | Monopole antenna array source with gas supply or grid filter for semiconductor process equipment | Srinivas D. Nemani | 2022-01-11 |
| 11222771 | Chemical control features in wafer process equipment | Rohit Sharma, Jingyu Qiao | 2022-01-11 |