Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11150563 | Method of measuring a parameter of a patterning process, metrology apparatus, target | Sergei Sokolov, Sergey Tarabrin, Su-Ting CHENG, Markus Franciscus Antonius Eurlings, Koenraad Remi André Maria Schreel | 2021-10-19 |
| 11099489 | Method of measuring a parameter of a lithographic process, metrology apparatus | Hugo Augustinus Joseph Cramer, Hilko Dirk Bos, Erik Johan Koop, Han-Kwang Nienhuys, Alessandro Polo +2 more | 2021-08-24 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10895812 | Metrology apparatus, lithographic system, and method of measuring a structure | Nitesh Pandey | 2021-01-19 |