Issued Patents 2020
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10847363 | Method of selective deposition for forming fully self-aligned vias | — | 2020-11-24 |
| 10847424 | Method for forming a nanowire device | Jeffrey Smith, Gerrit J. Leusink | 2020-11-24 |
| 10833078 | Semiconductor apparatus having stacked gates and method of manufacture thereof | Jeffrey Smith, Anton J. deVilliers, Subhadeep Kal, Gerrit J. Leusink | 2020-11-10 |
| 10790156 | Atomic layer etching using a boron-containing gas and hydrogen fluoride gas | Robert D. Clark | 2020-09-29 |
| 10790149 | Method of forming crystallographically stabilized ferroelectric hafnium zirconium based films for semiconductor devices | Robert D. Clark | 2020-09-29 |
| 10770479 | Three-dimensional device and method of forming the same | Jeffrey Smith, Anton J. deVilliers, Jodi Grzeskowiak, Kai-Hung Yu | 2020-09-08 |
| 10734278 | Method of protecting low-K layers | Hirokazu Aizawa, Karthikeyan Pillai, Nicholas Joy | 2020-08-04 |
| 10727057 | Platform and method of operating for integrated end-to-end self-aligned multi-patterning process | Robert D. Clark, Richard A. Farrell, Angelique Raley, Sophie Thibaut | 2020-07-28 |
| 10586734 | Method of selective film deposition for forming fully self-aligned vias | — | 2020-03-10 |
| 10586765 | Buried power rails | Jeffrey Smith, Anton J. deVilliers | 2020-03-10 |
| 10580658 | Method for preferential oxidation of silicon in substrates containing silicon and germanium | — | 2020-03-03 |
| 10580650 | Method for bottom-up formation of a film in a recessed feature | David L. O'Meara, Nihar Mohanty | 2020-03-03 |
| 10580644 | Method and apparatus for selective film deposition using a cyclic treatment | — | 2020-03-03 |
| 10529584 | In-situ selective deposition and etching for advanced patterning applications | — | 2020-01-07 |
| 10529830 | Extension region for a semiconductor device | Jeffrey Smith, Nihar Mohanty, Anton J. deVilliers | 2020-01-07 |