Issued Patents 2020
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879073 | Insulating gate separation structure for transistor devices | Chanro Park, Ruilong Xie, Hui Zang, Andre P. Labonte | 2020-12-29 |
| 10790363 | IC structure with metal cap on cobalt layer and methods of forming same | Kevin J. Ryan, Ruilong Xie, Hui Zang | 2020-09-29 |
| 10741656 | Wraparound contact surrounding source/drain regions of integrated circuit structures and method of forming same | Hui Zang, Ruilong Xie, Shesh Mani Pandey | 2020-08-11 |
| 10741451 | FinFET having insulating layers between gate and source/drain contacts | Hui Zang, Shesh Mani Pandey, Chanro Park, Ruilong Xie | 2020-08-11 |
| 10727136 | Integrated gate contact and cross-coupling contact formation | Hui Zang, Ruilong Xie, Chanro Park | 2020-07-28 |
| 10707206 | Gate cut isolation formed as layer against sidewall of dummy gate mandrel | Hui Zang, Ruilong Xie | 2020-07-07 |
| 10699957 | Late gate cut using selective dielectric deposition | Hui Zang, Ruilong Xie, Jiehui Shu, Chanro Park | 2020-06-30 |
| 10586860 | Method of manufacturing finfet devices using narrow and wide gate cut openings in conjunction with a replacement metal gate process | Jiehui Shu, Xusheng Wu, John H. Zhang, Haigou Huang, Hui Zhan +4 more | 2020-03-10 |
| 10580685 | Integrated single diffusion break | Hui Zang, Haiting Wang, Hong Yu | 2020-03-03 |
| 10573753 | Oxide spacer in a contact over active gate finFET and method of production thereof | Hui Zang, Jiehui Shu, Ruilong Xie | 2020-02-25 |
| 10566201 | Gate cut method after source/drain metallization | Chanro Park, Ruilong Xie, Hui Zang, Andre P. Labonte | 2020-02-18 |
| 10553698 | Methods, apparatus and system for a self-aligned gate cut on a semiconductor device | Hui Zang, Ruilong Xie | 2020-02-04 |
| 10553486 | Field effect transistors with self-aligned metal plugs and methods | Hui Zang, Ruilong Xie | 2020-02-04 |
| 10546853 | Metal resistors integrated into poly-open-chemical-mechanical-polishing (POC) module and method of production thereof | Hui Zang, Ruilong Xie | 2020-01-28 |
| 10535771 | Method for forming replacement air gap | Shesh Mani Pandey, Hui Zang, Haiting Wang, Jinping Liu | 2020-01-14 |