Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879373 | Structure and formation method of semiconductor device with metal gate stack | Chang-Miao Liu, Huiling Shang | 2020-12-29 |
| 10868174 | Devices with strained isolation features | Chang-Miao Liu, Huiling Shang | 2020-12-15 |
| 10840375 | Integrated circuits with channel-strain liner | Chang-Miao Liu, Huiling Shang | 2020-11-17 |
| 10818543 | Source/drain contact spacers and methods of forming same | — | 2020-10-27 |
| 10644156 | Methods, apparatus, and system for reducing gate cut gouging and/or gate height loss in semiconductor devices | Jinsheng Gao, Daniel Jaeger, Michael V. Aquilino, Patrick Carpenter, Haigou Huang | 2020-05-05 |
| 10586860 | Method of manufacturing finfet devices using narrow and wide gate cut openings in conjunction with a replacement metal gate process | Jiehui Shu, Laertis Economikos, John H. Zhang, Haigou Huang, Hui Zhan +4 more | 2020-03-10 |