Issued Patents 2019
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10395925 | Patterning material film stack comprising hard mask layer having high metal content interface to resist layer | Ekmini Anuja De Silva, Adra Carr, Shanti Pancharatnam, Yasir Sulehria | 2019-08-27 |
| 10381348 | Structure and method for equal substrate to channel height between N and P fin-FETs | Lawrence A. Clevenger, Leigh Anne H. Clevenger, Mona A. Ebrish, Gauri Karve, Fee Li Lie +2 more | 2019-08-13 |
| 10361127 | Vertical transport FET with two or more gate lengths | Gauri Karve, Fee Li Lie, Mona A. Ebrish, Leigh Anne H. Clevenger, Ekmini Anuja De Silva +1 more | 2019-07-23 |
| 10361129 | Self-aligned double patterning formed fincut | Stuart A. Sieg, Yann Mignot, Christopher J. Waskiewicz, Hemanth Jagannathan, Eric R. Miller | 2019-07-23 |
| 10304744 | Inverse tone direct print EUV lithography enabled by selective material deposition | Praveen Joseph, Ekmini Anuja De Silva, Fee Li Lie, Stuart A. Sieg, Yann Mignot | 2019-05-28 |
| 10276452 | Low undercut N-P work function metal patterning in nanosheet replacement metal gate process | Ekmini Anuja De Silva, Jing Guo, Romain Lallement, Ruqiang Bao, Zhenxing Bi +1 more | 2019-04-30 |
| 10254652 | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning | Ekmini Anuja De Silva, Karen E. Petrillo | 2019-04-09 |
| 10176997 | Direct gate patterning for vertical transport field effect transistor | Ekmini Anuja De Silva, Stuart A. Sieg, Wenyu Xu | 2019-01-08 |