Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504735 | Method of forming a semiconductor device by high-pressure anneal and post-anneal treatment | Hongfa Luan, Huicheng Chang, Cheng-Po Chau, Wen-Yu Ku, Chun-Yen Peng | 2019-12-10 |
| 10401732 | Optimization flows of source, mask and projection optics | Duan-Fu Stephen Hsu, Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou | 2019-09-03 |
| 10249530 | Interlayer dielectric film in semiconductor devices | Tsan-Chun Wang, De-Wei Yu, Ziwei Fang | 2019-04-02 |