Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10423745 | Correction for flare effects in lithography system | Hua-Yu Liu, Jiangwei Li, Wei-Cheng Liu, Jiong Jiang | 2019-09-24 |
| 10424395 | Computation pipeline of single-pass multiple variant calls | Jun Ye, Wei Zhou, Hanying Feng, Hong Chen, Xiaofeng Liu | 2019-09-24 |
| 10424396 | Computation pipeline of location-dependent variant calls | Jun Ye, Wei Zhou, Hanying Feng, Hong Chen, Xiaofeng Liu | 2019-09-24 |
| 10401732 | Optimization flows of source, mask and projection optics | Duan-Fu Stephen Hsu, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2019-09-03 |
| 10198549 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Jun Ye | 2019-02-05 |