Issued Patents 2019
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10509310 | Patterning devices for use within a lithographic apparatus, methods of making and using such patterning devices | Frank Arnoldus Johannes Maria Driessen | 2019-12-17 |
| 10459346 | Flows of optimization for lithographic processes | Rafael C. Howell, Xiaofeng Liu | 2019-10-29 |
| 10401732 | Optimization flows of source, mask and projection optics | Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2019-09-03 |
| 10394131 | Image log slope (ILS) optimization | — | 2019-08-27 |
| 10386727 | Pattern placement error aware optimization | Jianjun Jia, Xiaofeng Liu, Cuiping Zhang | 2019-08-20 |
| 10331039 | Rule-based deployment of assist features | Kurt E. Wampler | 2019-06-25 |
| 10310386 | Optimization of assist features and source | Feng-Liang Liu | 2019-06-04 |