| 10490599 |
Collimated, directional micro-LED light field display |
Manivannan Thothadri, Christopher Dennis Bencher, Robert Jan Visser |
2019-11-26 |
| 10460969 |
Bipolar electrostatic chuck and method for using the same |
Shreesha Yogish Rao |
2019-10-29 |
| 10453718 |
Slit valve door with moving mating part |
Mehran Behdjat, Shinichi Kurita, Suhail Anwar, Makoto Inagawa |
2019-10-22 |
| 10410899 |
Bipolar electrostatic chuck and method for using the same |
Shreesha Yogish Rao |
2019-09-10 |
| 10379450 |
Apparatus and methods for on-the-fly digital exposure image data modification |
Benjamin M. Johnston, Thomas Laidig, Jang Fung Chen |
2019-08-13 |
| 10312058 |
Plasma uniformity control by gas diffuser hole design |
Soo Young Choi, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita +4 more |
2019-06-04 |
| 10304713 |
Substrate carrier with integrated electrostatic chuck |
Zuoqian Wang |
2019-05-28 |
| 10304607 |
RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus |
Jozef Kudela, Carl A. Sorensen |
2019-05-28 |
| 10297483 |
Substrate carrier with integrated electrostatic chuck |
Zuoqian Wang |
2019-05-21 |
| 10262837 |
Plasma uniformity control by gas diffuser hole design |
Soo Young Choi, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita +4 more |
2019-04-16 |
| 10256382 |
Collimated OLED light field display |
Christopher Dennis Bencher, Manivannan Thothadri, Robert Jan Visser |
2019-04-09 |
| 10233528 |
Mask for deposition system and method for using the mask |
Robert Jan Visser |
2019-03-19 |
| 10190693 |
Door seal for vacuum chamber |
— |
2019-01-29 |
| 10184179 |
Atomic layer deposition processing chamber permitting low-pressure tool replacement |
Shinichi Kurita, Jozef Kudela, Dieter Haas |
2019-01-22 |
