| 10503076 |
Reserving spatial light modulator sections to address field non-uniformities |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-12-10 |
| 10495979 |
Half tone scheme for maskless lithography |
Christopher Dennis Bencher, Joseph R. Johnson |
2019-12-03 |
| 10495975 |
Line edge roughness reduction via step size alteration |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-12-03 |
| 10488762 |
Method to reduce data stream for spatial light modulator |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-11-26 |
| 10416550 |
Method to reduce line waviness |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-09-17 |
| 10409172 |
Digital photolithography using compact eye module layout |
David A. Markle, Timothy N. Thomas |
2019-09-10 |
| 10379450 |
Apparatus and methods for on-the-fly digital exposure image data modification |
Benjamin M. Johnston, Jang Fung Chen, John M. White |
2019-08-13 |
| 10372042 |
Resolution enhanced digital lithography with anti-blazed DMD |
Hwan J. Jeong |
2019-08-06 |
| 10331038 |
Real time software and array control |
Uwe Hollerbach, Mark Hunt, Don STARSES |
2019-06-25 |
| 10289003 |
Line edge roughness reduction via step size alteration |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-05-14 |
