| 10509328 |
Fabrication and use of dose maps and feature size maps during substrate processing |
Christopher Dennis Bencher |
2019-12-17 |
| 10503076 |
Reserving spatial light modulator sections to address field non-uniformities |
Thomas Laidig, Christopher Dennis Bencher |
2019-12-10 |
| 10495975 |
Line edge roughness reduction via step size alteration |
Thomas Laidig, Christopher Dennis Bencher |
2019-12-03 |
| 10495979 |
Half tone scheme for maskless lithography |
Christopher Dennis Bencher, Thomas Laidig |
2019-12-03 |
| 10488762 |
Method to reduce data stream for spatial light modulator |
Thomas Laidig, Christopher Dennis Bencher |
2019-11-26 |
| 10416550 |
Method to reduce line waviness |
Christopher Dennis Bencher, Thomas Laidig |
2019-09-17 |
| 10394130 |
Quarter wave light splitting |
Christopher Dennis Bencher, Dave Markle, Mehdi Vaez-Iravani |
2019-08-27 |
| 10289003 |
Line edge roughness reduction via step size alteration |
Thomas Laidig, Christopher Dennis Bencher |
2019-05-14 |
| 10234630 |
Method for creating a high refractive index wave guide |
Rutger Meyer Timmerman Thijssen, Steven Verhaverbeke |
2019-03-19 |
