Issued Patents 2018
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10115593 | Chemical modification of hardmask films for enhanced etching and selective removal | David Knapp, Simon Huang, Jeffrey W. Anthis, Philip Alan Kraus | 2018-10-30 |
| 10083834 | Methods of forming self-aligned vias | Benjamin Schmiege, Jeffrey W. Anthis, Abhijit Basu Mallick, Susmit Singha Roy, Ziqing Duan | 2018-09-25 |
| 10023958 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Victor Nguyen, Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly | 2018-07-17 |
| 9875889 | Atomic layer deposition of films comprising Si(C)N using hydrazine, azide and/or silyl amine derivatives | — | 2018-01-23 |
| 9870915 | Chemical modification of hardmask films for enhanced etching and selective removal | David Knapp, Simon Huang, Jeffrey W. Anthis, Philip Alan Kraus | 2018-01-16 |