Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10023958 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly, David Thompson | 2018-07-17 |
| 9984868 | PEALD of films comprising silicon nitride | Woong Jae Lee, Mihaela Balseanu, Li-Qun Xia, Derek R. Witty | 2018-05-29 |
| 9875888 | High temperature silicon oxide atomic layer deposition technology | Wenbo Yan, Cong Trinh, Ning Li, Mihaela Balseanu, Li-Qun Xia +1 more | 2018-01-23 |