Issued Patents 2018
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10139729 | Coating composition for pattern reversal on soc pattern | Hiroaki Yaguchi, Makoto Nakajima, Wataru SHIBAYAMA, Satoshi Takeda, Hiroyuki Wakayama | 2018-11-27 |
| 10133178 | Coating liquid for resist pattern coating | Tokio NISHITA, Shuhei Shigaki, Noriaki Fujitani, Takafumi Endo | 2018-11-20 |
| 10113083 | Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound | Ryuji Ohnishi, Ryuta MIZUOCHI, Tokio NISHITA, Yasushi Sakaida | 2018-10-30 |
| 10082735 | Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure | Wataru SHIBAYAMA, Shuhei Shigaki, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama | 2018-09-25 |
| 10067423 | Additive and resist underlayer film-forming composition containing the same | Yuto HASHIMOTO, Yasushi Sakaida, Kenji Takase | 2018-09-04 |
| 10042247 | Mask blank, method for manufacturing mask blank and transfer mask | Takahiro Hiromatsu, Masahiro Hashimoto, Yasushi Sakaida, Ryuta MIZUOCHI, Masaki Nagai | 2018-08-07 |
| 10042258 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | Noriaki Fujitani, Takafumi Endo | 2018-08-07 |
| 10025191 | Polymer-containing coating liquid applied to resist pattern | Shuhei Shigaki, Yasushi Sakaida | 2018-07-17 |
| 10017664 | Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde | Takafumi Endo, Keisuke Hashimoto, Hirokazu Nishimaki | 2018-07-10 |
| 10000664 | Underlayer film-forming composition for self-assembled films | Hiroyuki Wakayama, Makoto Nakajima | 2018-06-19 |
| 9977331 | Resist overlayer film forming composition and method for producing semiconductor device including the same | Noriaki Fujitani | 2018-05-22 |
| 9927705 | Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same | Noriaki Fujitani, Takafumi Endo, Ryuji Ohnishi | 2018-03-27 |
| 9910354 | Resist underlayer film-forming composition and method for forming resist pattern using the same | Yasushi Sakaida, Tokio NISHITA, Noriaki Fujitani | 2018-03-06 |