Issued Patents 2018
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9997416 | Low resistance dual liner contacts for fin field-effect transistors (FinFETs) | Praneet Adusumilli, Veeraraghavan S. Basker | 2018-06-12 |
| 9991355 | Implantation formed metal-insulator-semiconductor (MIS) contacts | Chia-Yu Chen, Tenko Yamashita, Chun-Chen Yeh | 2018-06-05 |
| 9978750 | Low resistance source/drain contacts for complementary metal oxide semiconductor (CMOS) devices | Praneet Adusumilli, Oleg Gluschenkov, Dechao Guo, Rajasekhar Venigalla, Tenko Yamashita | 2018-05-22 |
| 9972682 | Low resistance source drain contact formation | Oleg Gluschenkov, Shogo Mochizuki, Hiroaki Niimi, Chun-Chen Yeh | 2018-05-15 |
| 9947744 | Nanowire semiconductor device including lateral-etch barrier region | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2018-04-17 |
| 9947586 | Tunneling fin type field effect transistor with epitaxial source and drain regions | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2018-04-17 |
| 9923074 | Pure boron for silicide contact | Chia-Yu Chen, Sanjay C. Mehta, Tenko Yamashita | 2018-03-20 |
| 9917060 | Forming a contact for a semiconductor device | Oleg Gluschenkov, Shogo Mochizuki, Hiroaki Niimi, Ruilong Xie | 2018-03-13 |
| 9899525 | Increased contact area for finFETs | Veeraraghavan S. Basker, Chung-Hsun Lin, Tenko Yamashita, Chun-Chen Yeh | 2018-02-20 |
| 9899524 | Split fin field effect transistor enabling back bias on fin type field effect transistors | Veeraraghavan S. Basker, Xin Miao, Tenko Yamashita | 2018-02-20 |
| 9893171 | Fin field effect transistor fabrication and devices having inverted T-shaped gate | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2018-02-13 |
| 9882024 | Epitaxial and silicide layer formation at top and bottom surfaces of semiconductor fins | Kangguo Cheng, Ruilong Xie, Tenko Yamashita | 2018-01-30 |
| 9870958 | Forming CMOSFET structures with different contact liners | Kangguo Cheng, Tenko Yamashita | 2018-01-16 |
| 9871041 | Fabrication of vertical doped fins for complementary metal oxide semiconductor field effect transistors | Kangguo Cheng, Sanjay C. Mehta, Tenko Yamashita | 2018-01-16 |
| 9865508 | Method and structure to fabricate closely packed hybrid nanowires at scaled pitch | Veeraraghavan S. Basker, Tenko Yamashita, Chun-Chen Yeh | 2018-01-09 |
| 9859281 | Dual FIN integration for electron and hole mobility enhancement | Chia-Yu Chen, Miaomiao Wang, Tenko Yamashita | 2018-01-02 |
| 9859286 | Low-drive current FinFET structure for improving circuit density of ratioed logic in SRAM devices | Veeraraghavan S. Basker, Dechao Guo, Tenko Yamashita, Chun-Chen Yeh | 2018-01-02 |
| 9859275 | Silicon nitride fill for PC gap regions to increase cell density | Dechao Guo, Tenko Yamashita, Chun-Chen Yeh | 2018-01-02 |