| 10090247 |
Semiconductor device formed by wet etch removal of Ru selective to other metals |
Benjamin D. Briggs, David L. Rath |
2018-10-02 |
| 10062560 |
Method of cleaning semiconductor device |
Kevin J. Ryan, Shariq Siddiqui, Frank W. Mont |
2018-08-28 |
| 10002831 |
Selective and non-selective barrier layer wet removal |
Benjamin D. Briggs, Elbert E. Huang, Raghuveer R. Patlolla, David L. Rath, Hosadurga Shobha |
2018-06-19 |
| 9984923 |
Barrier layers in trenches and vias |
Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang |
2018-05-29 |
| 9947547 |
Environmentally green process and composition for cobalt wet etch |
Frank W. Mont, Shariq Siddiqui, Randolph F. Knarr |
2018-04-17 |
| 9881833 |
Barrier planarization for interconnect metallization |
Benjamin D. Briggs, Elbert E. Huang, Takeshi Nogami, Raghuveer R. Patlolla, David L. Rath |
2018-01-30 |
| 9859218 |
Selective surface modification of interconnect structures |
Raghuveer R. Patlolla, Roger A. Quon, Chih-Chao Yang |
2018-01-02 |
