CW

Christopher Charles Ward

AN Asml Holding N.V.: 4 patents #1 of 71Top 2%
AB Asml Netherlands B.V.: 4 patents #41 of 559Top 8%
📍 Culver City, CA: #7 of 130 inventorsTop 6%
🗺 California: #4,911 of 60,411 inventorsTop 9%
Overall (2018): #47,456 of 503,207Top 10%
4
Patents 2018

Issued Patents 2018

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
10031428 Gas flow optimization in reticle stage environment Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven +9 more 2018-07-24
9977351 Patterning device support, lithographic apparatus, and method of controlling patterning device temperature Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more 2018-05-22
9910368 Patterning device manipulating system and lithographic apparatuses Christiaan Louis Valentin, Erik Roelof Loopstra, Daniel Nathan Burbank, Mark Josef Schuster, Peter James Graffeo 2018-03-06
9857694 Estimating deformation of a patterning device and/or a change in its position Bearrach Moest, Peter A. Delmastro, Johannes Onvlee, Adrianus Martinus Van Der Wielen 2018-01-02