Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10031428 | Gas flow optimization in reticle stage environment | Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven +9 more | 2018-07-24 |
| 9977351 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Earl William Ebert, Johannes Onvlee, Samir Nayfeh, Mark Josef Schuster, Peter A. Delmastro +5 more | 2018-05-22 |
| 9910368 | Patterning device manipulating system and lithographic apparatuses | Christiaan Louis Valentin, Erik Roelof Loopstra, Christopher Charles Ward, Mark Josef Schuster, Peter James Graffeo | 2018-03-06 |