Issued Patents 2017
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D803911 | Programmable controller | Kazuma SUZUKI, Yasunori Tsuboi, Sutemaro Kato | 2017-11-28 |
| 9829792 | Monomer, polymer, positive resist composition, and patterning process | Jun Hatakeyama, Teppei Adachi | 2017-11-28 |
| D803281 | Programmable controller | Kazuma SUZUKI, Yasunori Tsuboi, Sutemaro Kato | 2017-11-21 |
| D803280 | Programmable controller | Kazuma SUZUKI, Yasunori Tsuboi, Sutemaro Kato | 2017-11-21 |
| 9810983 | Polymer, chemically amplified positive resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2017-11-07 |
| 9790166 | Polymer, monomer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Jun Hatakeyama, Kazuhiro Katayama | 2017-10-17 |
| 9793653 | Controller unit | Kazuhiro Sugita, Yasunori Tsuboi, Sutemaro Kato | 2017-10-17 |
| 9777093 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Fujiwara, Takayuki Nagasawa | 2017-10-03 |
| 9758609 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Kazuhiro Katayama, Jun Hatakeyama | 2017-09-12 |
| 9752045 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2017-09-05 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Ryosuke Taniguchi | 2017-08-22 |
| 9720324 | Resist composition and pattern forming process | Jun Hatakeyama | 2017-08-01 |
| 9709890 | Resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi, Daisuke Domon | 2017-07-18 |
| 9663593 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Masaki Ohashi, Masayoshi Sagehashi | 2017-05-30 |
| 9657115 | Polymer compound for a conductive polymer and method for manufacturing same | Jun Hatakeyama, Takayuki Nagasawa, Masayoshi Sagehashi | 2017-05-23 |
| 9632415 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Masayoshi Sagehashi | 2017-04-25 |
| 9618850 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Kenji Funatsu | 2017-04-11 |
| 9601229 | Conductive polymer composite comprising a sulfo group-containing dopant polymer | Jun Hatakeyama, Takayuki Nagasawa | 2017-03-21 |
| 9595362 | Conductive polymer composition comprising a sulfo group-containing dopant polymer | Jun Hatakeyama, Takayuki Nagasawa | 2017-03-14 |
| 9587137 | Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate | Takayuki Nagasawa, Jun Hatakeyama | 2017-03-07 |
| 9551932 | Patterning process and resist composition | Kenji Funatsu, Kentaro Kumaki, Akihiro Seki, Tomohiro Kobayashi | 2017-01-24 |
| 9535325 | Onium salt, chemically amplified positive resist composition, and patterning process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima | 2017-01-03 |