Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9846360 | Resist composition and patterning process | Jun Hatakeyama | 2017-12-19 |
| 9829792 | Monomer, polymer, positive resist composition, and patterning process | Koji Hasegawa, Jun Hatakeyama | 2017-11-28 |
| 9760010 | Patterning process | Jun Hatakeyama | 2017-09-12 |