Issued Patents 2017
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9790166 | Polymer, monomer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2017-10-17 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Masayoshi Sagehashi, Ryosuke Taniguchi | 2017-08-22 |
| 9665002 | Onium salt compound, resist composition, and pattern forming process | Masaki Ohashi, Jun Hatakeyama | 2017-05-30 |
| 9604921 | Sulfonium salt, resist composition and resist pattern forming process | Daisuke Domon, Satoshi Watanabe, Keiichi Masunaga | 2017-03-28 |
| 9535325 | Onium salt, chemically amplified positive resist composition, and patterning process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Koji Hasegawa | 2017-01-03 |