Issued Patents 2017
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9810983 | Polymer, chemically amplified positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2017-11-07 |
| 9790166 | Polymer, monomer, resist composition, and patterning process | Koji Hasegawa, Masahiro Fukushima, Jun Hatakeyama, Kazuhiro Katayama | 2017-10-17 |
| 9758609 | Monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Kazuhiro Katayama, Jun Hatakeyama | 2017-09-12 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Masahiro Fukushima, Ryosuke Taniguchi | 2017-08-22 |
| 9709890 | Resist composition and patterning process | Jun Hatakeyama, Daisuke Domon, Koji Hasegawa | 2017-07-18 |
| 9663593 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa, Masaki Ohashi | 2017-05-30 |
| 9657115 | Polymer compound for a conductive polymer and method for manufacturing same | Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa | 2017-05-23 |
| 9632415 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Koji Hasegawa | 2017-04-25 |