| 9842739 |
Method and structure for enabling high aspect ratio sacrificial gates |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre |
2017-12-12 |
| 9786666 |
Method to form dual channel semiconductor material fins |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, Eric R. Miller, John R. Sporre |
2017-10-10 |
| 9768075 |
Method and structure to enable dual channel fin critical dimension control |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2017-09-19 |
| 9754942 |
Single spacer for complementary metal oxide semiconductor process flow |
Marc A. Bergendahl, Kangguo Cheng, Jessica Dechene, Fee Li Lie, Eric R. Miller +2 more |
2017-09-05 |
| 9748146 |
Single spacer for complementary metal oxide semiconductor process flow |
Marc A. Bergendahl, Kangguo Cheng, Jessica Dechene, Fee Li Lie, Eric R. Miller +2 more |
2017-08-29 |
| 9728622 |
Dummy gate formation using spacer pull down hardmask |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2017-08-08 |
| 9716184 |
Enabling large feature alignment marks with sidewall image transfer patterning |
Kangguo Cheng, Sivananda K. Kanakasabapathy, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2017-07-25 |
| 9659779 |
Method and structure for enabling high aspect ratio sacrificial gates |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre |
2017-05-23 |
| 9627277 |
Method and structure for enabling controlled spacer RIE |
Kangguo Cheng, Ryan O. Jung, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2017-04-18 |
| 9620590 |
Nanosheet channel-to-source and drain isolation |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2017-04-11 |
| 9608065 |
Air gap spacer for metal gates |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2017-03-28 |
| 9553044 |
Electrically conductive interconnect including via having increased contact surface area |
Hsueh-Chung Chen, James J. Demarest, Chih-Chao Yang |
2017-01-24 |
| 9536744 |
Enabling large feature alignment marks with sidewall image transfer patterning |
Kangguo Cheng, Sivananda K. Kanakasabapathy, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2017-01-03 |
