Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
KF

Keith E. Fogel — 31 Patents in 2017

IBM: 27 patents #86 of 10,852Top 1%
Globalfoundries: 4 patents #123 of 1,311Top 10%
Hopewell Junction, NY: #1 of 93 inventorsTop 2%
New York: #40 of 12,278 inventorsTop 1%
Overall (2017): #603 of 506,227Top 1%
31 Patents 2017

Issued Patents 2017

Showing 1–25 of 31 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
9818909 LED light extraction enhancement enabled using self-assembled particles patterned surface Jeehwan Kim, Ning Li, Devendra K. Sadana 2017-11-14 $4,491,000
9799747 Low resistance contact for semiconductor devices Joel P. de Souza, Jeehwan Kim, Devendra K. Sadana, Brent A. Wacaser 2017-10-24 $3,030,000
9799600 Nickel-silicon fuse for FinFET structures Kangguo Cheng, Pouya Hashemi, Alexander Reznicek 2017-10-24 $3,030,000
9793114 Uniform height tall fins with varying silicon germanium concentrations Stephen W. Bedell, Bruce B. Doris, Alexander Reznicek 2017-10-17 $4,096,000
9768254 Leakage-free implantation-free ETSOI transistors Joel P. de Souza, Jeehwan Kim, Devendra K. Sadana 2017-09-19 $2,669,000
9768262 Embedded carbon-doped germanium as stressor for germanium nFET devices Jeffrey L. Dittmar, Sebastian Naczas, Alexander Reznicek, Devendra K. Sadana 2017-09-19 $2,669,000
9754875 Designable channel FinFET fuse Pouya Hashemi, Shogo Mochizuki, Alexander Reznicek 2017-09-05 $2,785,000
9748353 Method of making a gallium nitride device Stephen W. Bedell, Paul A. Lauro, Devendra K. Sadana 2017-08-29 $2,195,000
9741880 Three-dimensional conductive electrode for solar cell Augustin J. Hong, Jeehwan Kim, Devendra K. Sadana 2017-08-22 $2,056,000
9741807 FinFET device with vertical silicide on recessed source/drain epitaxy regions Pranita Kerber, Qiqing C. Ouyang, Alexander Reznicek 2017-08-22 $2,056,000
9722033 Doped zinc oxide as n+ layer for semiconductor devices Joel P. Desouza, Jeehwan Kim, Ko-Tao Lee, Devendra K. Sadana 2017-08-01 $1,638,000
9722039 Fabricating high-power devices Stephen W. Bedell, Paul A. Lauro, Devendra K. Sadana 2017-08-01 $1,638,000
9716207 Low reflection electrode for photovoltaic devices Jeehwan Kim, David B. Mitzi, Mark T. Winkler 2017-07-25 $18,264,000
9713250 Patterned metallization handle layer for controlled spalling Turki bin Saud bin Mohammed Al-Saud, Stephen W. Bedell, Paul A. Lauro, Devendra K. Sadana 2017-07-18 $2,009,000
9704860 Epitaxial oxide fin segments to prevent strained semiconductor fin end relaxation Karthik Balakrishnan, Sivananda K. Kanakasabapathy, Alexander Reznicek 2017-07-11 $1,748,000
9666674 Formation of large scale single crystalline graphene Christos D. Dimitrakopoulos, Jeehwan Kim, Hongsik Park 2017-05-30 $11,286,000
9660116 Nanowires formed by employing solder nanodots Jeehwan Kim, Jae-Woong Nah, Devendra K. Sadana, Kuen-Ting Shiu 2017-05-23 $2,171,000
9653570 Junction interlayer dielectric for reducing leakage current in semiconductor devices Joel P. de Souza, Jeehwan Kim, Devendra K. Sadana, Brent A. Wacaser 2017-05-16 $2,370,000
9646832 Porous fin as compliant medium to form dislocation-free heteroepitaxial films Kangguo Cheng, Jeehwan Kim, Devendra K. Sadana 2017-05-09 $2,584,000
9634164 Reduced light degradation due to low power deposition of buffer layer Augustin J. Hong, Jeehwan Kim, Devendra K. Sadana 2017-04-25 $1,937,000
9620592 Doped zinc oxide and n-doping to reduce junction leakage Joel P. de Souza, Jeehwan Kim, Siegfried Maurer, Devendra K. Sadana 2017-04-11 $2,654,000
9601482 Economical and environmentally friendly chemical mechanical polishing for III-V compound semiconductor device fabrication Alexander Reznicek, Devendra K. Sadana, Charan V. Surisetty 2017-03-21 $2,195,000
9601624 SOI based FINFET with strained source-drain regions Stephen W. Bedell, Joel P. de Souza, Alexander Reznicek, Devendra K. Sadana, Dominic J. Schepis 2017-03-21 $11,989,000
9583572 FinFET devices having silicon germanium channel fin structures with uniform thickness Veeraraghavan S. Basker, Pouya Hashemi, Alexander Reznicek 2017-02-28 $2,397,000
9576806 FinFET device with vertical silicide on recessed source/drain epitaxy regions Pranita Kerber, Qiqing C. Ouyang, Alexander Reznicek 2017-02-21 $2,827,000