Issued Patents 2016
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9522979 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | Takeru Watanabe, Yoshinori Taneda, Tsutomu Ogihara | 2016-12-20 |
| 9460934 | Wet strip process for an antireflective coating layer | Martin Glodde, Wu-Song Huang, Javier Perez, Takeshi Kinsho, Tsutomu Ogihara +1 more | 2016-10-04 |
| 9377690 | Compositon for forming metal oxide-containing film and patterning process | Tsutomu Ogihara, Takafumi Ueda, Yoshinori Taneda | 2016-06-28 |
| 9372404 | Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer | Takeru Watanabe, Toshihiko Fujii, Kazumi Noda, Toshiharu Yano, Takeshi Kinsho | 2016-06-21 |
| 9312127 | Method for producing semiconductor apparatus substrate | Tsutomu Ogihara, Daisuke KORI, Yoshinori Taneda, Yusuke Biyajima, Rie Kikuchi | 2016-04-12 |
| 9274425 | Resist composition and patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2016-03-01 |
| 9261788 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2016-02-16 |
| 9233919 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Masaki Ohashi, Jun Hatakeyama | 2016-01-12 |
| 9230827 | Method for forming a resist under layer film and patterning process | Shiori Nonaka, Daisuke KORI, Toshihiko Fujii, Tsutomu Ogihara | 2016-01-05 |