Issued Patents 2016
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9527937 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa, Masayoshi Sagehashi | 2016-12-27 |
| 9523914 | Chemically amplified resist composition and patterning process | Jun Hatakeyama | 2016-12-20 |
| 9519213 | Patterning process and resist composition | Tomohiro Kobayashi, Kazuhiro Katayama, Kentaro Kumaki, Chuanwen Lin, Masahiro Fukushima | 2016-12-13 |
| 9500949 | Chemically-amplified positive resist composition and resist patterning process using the same | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Masahiro Fukushima | 2016-11-22 |
| 9411225 | Photo acid generator, chemically amplified resist composition, and patterning process | Masahiro Fukushima, Kenichi Oikawa, Koji Hasegawa | 2016-08-09 |
| 9366958 | Photoacid generator, chemically amplified resist composition, and patterning process | Masahiro Fukushima | 2016-06-14 |
| 9329476 | Chemically amplified negative resist composition and patterning process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2016-05-03 |
| 9250518 | Resist composition and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2016-02-02 |
| 9233919 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Youichi Ohsawa, Seiichiro Tachibana, Jun Hatakeyama | 2016-01-12 |