Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9519213 | Patterning process and resist composition | Tomohiro Kobayashi, Kazuhiro Katayama, Kentaro Kumaki, Chuanwen Lin, Masaki Ohashi | 2016-12-13 |
| 9500949 | Chemically-amplified positive resist composition and resist patterning process using the same | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2016-11-22 |
| 9411225 | Photo acid generator, chemically amplified resist composition, and patterning process | Masaki Ohashi, Kenichi Oikawa, Koji Hasegawa | 2016-08-09 |
| 9366958 | Photoacid generator, chemically amplified resist composition, and patterning process | Masaki Ohashi | 2016-06-14 |
| 9348227 | Chemically amplified resist composition and pattern forming process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2016-05-24 |