Issued Patents 2016
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9527937 | Polymer compound for a conductive polymer and method for producing same | Koji Hasegawa, Takayuki Nagasawa, Masayoshi Sagehashi, Masaki Ohashi | 2016-12-27 |
| 9524863 | Method for cleaning and drying semiconductor substrate | Tsutomu Ogihara, Takeshi Nagata, Daisuke KORI | 2016-12-20 |
| 9523914 | Chemically amplified resist composition and patterning process | Masaki Ohashi | 2016-12-20 |
| 9507262 | Resist top-coat composition and patterning process | Hyun-Woo Kim | 2016-11-29 |
| 9493597 | Polymer compound having a specific super strongly acidic sulfo group | Koji Hasegawa, Takayuki Nagasawa | 2016-11-15 |
| 9482949 | Positive resist composition and patterning process | Koji Hasegawa | 2016-11-01 |
| 9442376 | Positive resist composition and patterning process | Koji Hasegawa | 2016-09-13 |
| 9436093 | Pattern forming process and shrink agent | Masayoshi Sagehashi | 2016-09-06 |
| 9429846 | Pattern forming process and shrink agent | Masayoshi Sagehashi, Teppei Adachi | 2016-08-30 |
| 9429843 | Positive resist composition and patterning process | Koji Hasegawa | 2016-08-30 |
| 9411226 | Chemically amplified resist composition and patterning process | — | 2016-08-09 |
| 9366963 | Resist composition and pattern forming process | Masayoshi Sagehashi | 2016-06-14 |
| 9360760 | Pattern forming process and shrink agent | Teppei Adachi | 2016-06-07 |
| 9360753 | Resist composition and patterning process | — | 2016-06-07 |
| 9335633 | Positive resist composition and patterning process | Koji Hasegawa, Masayoshi Sagehashi | 2016-05-10 |
| 9335632 | Positive resist composition and patterning process | Koji Hasegawa | 2016-05-10 |
| 9315670 | Composition for forming resist underlayer film and patterning process | Tsutomu Ogihara | 2016-04-19 |
| 9316915 | Negative resist composition and pattern forming process | Masayoshi Sagehashi | 2016-04-19 |
| 9316909 | Patterning process | — | 2016-04-19 |
| 9310683 | Monomer, polymer, positive resist composition and patterning process | Koji Hasegawa | 2016-04-12 |
| 9310681 | Negative resist composition and patterning process using same | Hiroyuki Urano, Masashi Iio | 2016-04-12 |
| 9274425 | Resist composition and patterning process | Kazuhiro Katayama, Seiichiro Tachibana | 2016-03-01 |
| 9274428 | Resist top coat composition and patterning process | Hyun-Woo Kim | 2016-03-01 |
| 9250518 | Resist composition and patterning process | Masaki Ohashi, Masayoshi Sagehashi | 2016-02-02 |
| 9250523 | Resist composition and patterning process | Kenji Funatsu, Kazuhiro Katayama | 2016-02-02 |