Issued Patents 2016
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9524863 | Method for cleaning and drying semiconductor substrate | Takeshi Nagata, Jun Hatakeyama, Daisuke KORI | 2016-12-20 |
| 9522979 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | Takeru Watanabe, Yoshinori Taneda, Seiichiro Tachibana | 2016-12-20 |
| 9502247 | Method for forming coating film for lithography | Taku Morisawa | 2016-11-22 |
| 9490144 | Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process | Takeru Watanabe | 2016-11-08 |
| 9460934 | Wet strip process for an antireflective coating layer | Martin Glodde, Wu-Song Huang, Javier Perez, Takeshi Kinsho, Seiichiro Tachibana +1 more | 2016-10-04 |
| 9377690 | Compositon for forming metal oxide-containing film and patterning process | Takafumi Ueda, Seiichiro Tachibana, Yoshinori Taneda | 2016-06-28 |
| 9315670 | Composition for forming resist underlayer film and patterning process | Jun Hatakeyama | 2016-04-19 |
| 9312144 | Composition for forming a silicon-containing resist under layer film and patterning process | Yusuke Biyajima | 2016-04-12 |
| 9312127 | Method for producing semiconductor apparatus substrate | Daisuke KORI, Yoshinori Taneda, Yusuke Biyajima, Rie Kikuchi, Seiichiro Tachibana | 2016-04-12 |
| 9261788 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Takeru Watanabe, Kazumi Noda, Toshiharu Yano | 2016-02-16 |
| 9248693 | Patterning process | — | 2016-02-02 |
| 9230827 | Method for forming a resist under layer film and patterning process | Shiori Nonaka, Seiichiro Tachibana, Daisuke KORI, Toshihiko Fujii | 2016-01-05 |