Issued Patents 2016
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9527937 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa, Masaki Ohashi | 2016-12-27 |
| 9458144 | Monomer, polymer, resist composition, and patterning process | Takayuki Fujiwara, Koji Hasegawa, Ryosuke Taniguchi | 2016-10-04 |
| 9436093 | Pattern forming process and shrink agent | Jun Hatakeyama | 2016-09-06 |
| 9429846 | Pattern forming process and shrink agent | Jun Hatakeyama, Teppei Adachi | 2016-08-30 |
| 9366963 | Resist composition and pattern forming process | Jun Hatakeyama | 2016-06-14 |
| 9335633 | Positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2016-05-10 |
| 9316915 | Negative resist composition and pattern forming process | Jun Hatakeyama | 2016-04-19 |
| 9285678 | Sulfonium salt, resist composition and resist pattern forming process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2016-03-15 |
| 9256127 | Monomer, polymer, resist composition, and patterning process | Takayuki Fujiwara, Koji Hasegawa, Ryosuke Taniguchi | 2016-02-09 |
| 9250522 | Positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2016-02-02 |
| 9250518 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi | 2016-02-02 |
| 9250517 | Polymer, positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2016-02-02 |
| 9244350 | Positive resist composition and patterning process | Jun Hatakeyama | 2016-01-26 |
| 9235122 | Monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Kazuhiro Katayama | 2016-01-12 |