Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9502238 | Deposition of conformal films by atomic layer deposition and atomic layer etch | Michal Danek, Shane Tang | 2016-11-22 |
| 9385318 | Method to integrate a halide-containing ALD film on sensitive materials | — | 2016-07-05 |
| 9287113 | Methods for depositing films on sensitive substrates | Hu Kang, Shankar Swaminathan, Adrien LaVoie | 2016-03-15 |
| 9240320 | Methods of depositing smooth and conformal ashable hard mask films | Pramod Subramonium, Zhiyuan Fang, Shawn Hancock, Mike Pierce | 2016-01-19 |
| 9230800 | Plasma activated conformal film deposition | Adrien LaVoie, Shankar Swaminathan, Hu Kang, Ramesh Chandrasekharan, Tom Dorsh +9 more | 2016-01-05 |