| 9530701 |
Method of forming semiconductor fins on SOI substrate |
Kangguo Cheng, Joseph Ervin, Chengwen Pei, Geng Wang |
2016-12-27 |
| 9520357 |
Anti-fuse structure and method for manufacturing the same |
Hong He, Junli Wang, Chih-Chao Yang |
2016-12-13 |
| 9490223 |
Structure to prevent deep trench moat charging and moat isolation fails |
Kangguo Cheng, Joseph Ervin, Chengwen Pei, Geng Wang |
2016-11-08 |
| 9484267 |
Stacked nanowire devices |
Kangguo Cheng, Ramachandra Divakaruni |
2016-11-01 |
| 9484201 |
Epitaxial silicon germanium fin formation using sacrificial silicon fin templates |
Hong He, Junli Wang, Chih-Chao Yang |
2016-11-01 |
| 9461042 |
Sublithographic width finFET employing solid phase epitaxy |
Kangguo Cheng, Joseph Ervin, Chengwen Pei, Ravi M. Todi, Geng Wang |
2016-10-04 |
| 9455314 |
Y-FET with self-aligned punch-through-stop (PTS) doping |
Kangguo Cheng, Ramachandra Divakaruni |
2016-09-27 |
| 9443977 |
FinFET with reduced source and drain resistance |
Kangguo Cheng, Xin Miao, Junli Wang |
2016-09-13 |
| 9431521 |
Stress memorization technique for strain coupling enhancement in bulk finFET device |
Kangguo Cheng, Chun-Chen Yeh |
2016-08-30 |
| 9431425 |
Directly forming SiGe fins on oxide |
Kangguo Cheng, Hong He, Junli Wang |
2016-08-30 |
| 9425196 |
Multiple threshold voltage FinFETs |
Kangguo Cheng, Ramachandra Divakaruni, Fee Li Lie |
2016-08-23 |
| 9397215 |
FinFET with reduced source and drain resistance |
Kangguo Cheng, Xin Miao, Junli Wang |
2016-07-19 |
| 9391204 |
Asymmetric FET |
Kangguo Cheng, Joseph Ervin, Chengwen Pei, Geng Wang |
2016-07-12 |
| 9379221 |
Bottom-up metal gate formation on replacement metal gate finFET devices |
Hong He, Junli Wang, Chih-Chao Yang |
2016-06-28 |
| 9379110 |
Method of fabrication of ETSOI CMOS device by sidewall image transfer (SIT) |
Kangguo Cheng |
2016-06-28 |
| 9343320 |
Pattern factor dependency alleviation for eDRAM and logic devices with disposable fill to ease deep trench integration with fins |
Kangguo Cheng, Joseph Ervin, Chengwen Pei, Geng Wang |
2016-05-17 |
| 9276013 |
Integrated formation of Si and SiGe fins |
Bruce B. Doris, Hong He, Junli Wang, Chih-Chao Yang |
2016-03-01 |
| 9228994 |
Nanochannel electrode devices |
Kangguo Cheng, Joseph Ervin, Chengwen Pei, Geng Wang |
2016-01-05 |
