| 9455143 |
Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devices |
Swaminathan Srinivasan, Matthias Bauer, Amikam Sade |
2016-09-27 |
| 9449858 |
Transparent reflector plate for rapid thermal processing chamber |
Blake Koelmel, Alexander Lerner |
2016-09-20 |
| 9431278 |
Backside rapid thermal processing of patterned wafers |
Wolfgang Aderhold, Sundar Ramamurthy |
2016-08-30 |
| 9390926 |
Process sheet resistance uniformity improvement using multiple melt laser exposures |
Jiping Li, Bruce E. Adams, Kim Vellore, Samuel C. Howells, Stephen Moffatt |
2016-07-12 |
| 9390950 |
Rapid thermal processing chamber with micro-positioning system |
Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Blake Koelmel, Alexander Lerner +1 more |
2016-07-12 |
| 9385004 |
Support cylinder for thermal processing chamber |
Mehran Behdjat, Joseph M. Ranish, Norman L. Tam, Jeffrey Tobin, Jiping Li +1 more |
2016-07-05 |
| 9373511 |
Methods for crystallizing a substrate using energy pulses and freeze periods |
Bruce E. Adams, Stephen Moffatt |
2016-06-21 |
| 9347132 |
Optical endpoint detection system |
Balasubramanian Ramachandran, Masato Ishii |
2016-05-24 |
| 9330955 |
Support ring with masked edge |
Mehran Behdjat, Norman L. Tam, Joseph M. Ranish, Koji Nakanishi, Toshiyuki Nakagawa |
2016-05-03 |
| 9285595 |
Multiple beam combiner for laser processing apparatus |
Stephen Moffatt, Douglas E. Holmgren, Samuel C. Howells, Edric Tong, Bruce E. Adams +1 more |
2016-03-15 |
| 9240341 |
Top wafer rotation and support |
Oleg V. Serebryanov, Joseph M. Ranish |
2016-01-19 |
