Issued Patents 2011
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8067809 | Semiconductor storage device including a gate insulating film with a favorable nitrogen concentration profile and method for manufacturing the same | Shigenori Ozaki, Akinobu Teramoto, Tadahiro Ohmi | 2011-11-29 |
| 8043979 | Plasma oxidizing method, storage medium, and plasma processing apparatus | Takashi Kobayashi, Yoshiro Kabe, Toshihiko Shiozawa | 2011-10-25 |
| 8034183 | Cleaning method and plasma processing method | Shingo Furui, Takashi Kobayashi | 2011-10-11 |
| 8034179 | Method for insulating film formation, storage medium from which information is readable with computer, and processing system | Yoshiro Kabe, Kikuo Yamabe | 2011-10-11 |
| 8026187 | Method of forming silicon oxide film and method of production of semiconductor memory device using this method | Yoshiro Kabe, Kikuo Yamabe | 2011-09-27 |
| 8003484 | Method for forming silicon oxide film, plasma processing apparatus and storage medium | Yoshiro Kabe, Takashi Kobayashi, Toshihiko Shiozawa | 2011-08-23 |
| 7989364 | Plasma oxidation processing method | Masaru Hori, Toshihiko Shiozawa, Yoshiro Kabe | 2011-08-02 |
| 7972973 | Method for forming silicon oxide film, plasma processing apparatus and storage medium | Takashi Kobayashi, Toshihiko Shinozawa, Yoshiro Abe | 2011-07-05 |
| 7955922 | Manufacturing method of fin-type field effect transistor | Hajime NAKABAYASHI, Takuya Sugawara, Takashi Kobayashi, Yoshitsugu Tanaka | 2011-06-07 |
| 7910495 | Plasma oxidizing method, plasma processing apparatus, and storage medium | Toshihiko Shiozawa, Yoshiro Kabe, Takashi Kobayashi, Hikaru Adachi, Nobuhiko Yamamoto | 2011-03-22 |
| 7910493 | Semiconductor device manufacturing method, semiconductor device, plasma nitriding treatment method, control program and computer storage medium | Takashi Kobayashi | 2011-03-22 |
| 7875322 | Plasma processing method | Takashi Kobayashi, Shingo Furui | 2011-01-25 |