Issued Patents 2011
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8054444 | Lens cleaning module for immersion lithography apparatus | David Lu | 2011-11-08 |
| 7999910 | System and method for manufacturing a mask for semiconductor processing | Chia-Jen Chen, Hsin-Chang Lee, Sheng-Chi Chin, Hung-Chang Hsieh | 2011-08-16 |
| 7986395 | Immersion lithography apparatus and methods | Ching-Yu Chang, Chin-Hsiang Lin | 2011-07-26 |
| RE42556 | Apparatus for method for immersion lithography | — | 2011-07-19 |
| 7972761 | Photoresist materials and photolithography process | Hsien-Cheng Wang, Chin-Hsiang Lin, H. J. Lee, Ching-Yu Chang, Hua-Tai Lin | 2011-07-05 |
| 7934177 | Method and system for a pattern layout split | Jaw-Jung Shin, King-Chang Shu, Tsai-Sheng Gau | 2011-04-26 |
| 7924397 | Anti-corrosion layer on objective lens for liquid immersion lithography applications | David Lu | 2011-04-12 |
| 7924401 | Seal ring arrangements for immersion lithography systems | Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, Shinn-Sheng Yu, Jen-Chieh Shih | 2011-04-12 |