Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7999910 | System and method for manufacturing a mask for semiconductor processing | Hsin-Chang Lee, Sheng-Chi Chin, Hung-Chang Hsieh, Burn Jeng Lin | 2011-08-16 |
| 7924405 | Compensation of reticle flatness on focus deviation in optical lithography | Lee-Chih Yeh, Hsin-Chang Lee, Tzu Yi Wang | 2011-04-12 |
| 7906252 | Multiple resist layer phase shift mask (PSM) blank and PSM formation method | Hsin-Chang Lee, Hong-Chang Hsieh, Lee-Chih Yeh | 2011-03-15 |