Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7924405 | Compensation of reticle flatness on focus deviation in optical lithography | Hsin-Chang Lee, Chia-Jen Chen, Tzu Yi Wang | 2011-04-12 |
| 7906252 | Multiple resist layer phase shift mask (PSM) blank and PSM formation method | Hsin-Chang Lee, Chia-Jen Chen, Hong-Chang Hsieh | 2011-03-15 |