Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8046860 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Chi-Lun Lu, Shih-Ming Chang, Wen-Chuan Wang +2 more | 2011-11-01 |
| 8048795 | Self-assembly pattern for semiconductor integrated circuit | Tsung-Lin Lee, Clement Hsingjen Wann | 2011-11-01 |
| 7993808 | TARC material for immersion watermark reduction | — | 2011-08-09 |
| 7986395 | Immersion lithography apparatus and methods | Burn Jeng Lin, Chin-Hsiang Lin | 2011-07-26 |
| 7972761 | Photoresist materials and photolithography process | Hsien-Cheng Wang, Chin-Hsiang Lin, H. J. Lee, Hua-Tai Lin, Burn Jeng Lin | 2011-07-05 |
| 7927779 | Water mark defect prevention for immersion lithography | — | 2011-04-19 |