MC

Michael P. Chudzik

IBM: 13 patents #130 of 9,568Top 2%
AM AMD: 2 patents #106 of 913Top 15%
📍 Danbury, CT: #1 of 99 inventorsTop 2%
🗺 Connecticut: #17 of 3,106 inventorsTop 1%
Overall (2011): #1,840 of 364,097Top 1%
13
Patents 2011

Issued Patents 2011

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
8053306 PFET with tailored dielectric and related methods and integrated circuit Rick Carter, Rashmi Jha, Naim Moumen 2011-11-08
8030716 Self-aligned CMOS structure with dual workfunction Dae-Gyu Park, Vijay Narayanan, Vamsi K. Paruchuri 2011-10-04
8021939 High-k dielectric and metal gate stack with minimal overlap with isolation region and related methods William K. Henson, Renee T. Mo, Jeffrey W. Sleight 2011-09-20
8012863 Transistors with gate stacks having metal electrodes Paul Kirsch 2011-09-06
7947549 Gate effective-workfunction modification for CMOS Dae-Gyu Park, Rashmi Jha, Siddarth A. Krishnan, Naim Moumen, Vijay Narayanan +1 more 2011-05-24
7943457 Dual metal and dual dielectric integration for metal high-k FETs Wiliam K. Henson, Rashmi Jha, Yue Liang, Ravikumar Ramachandran, Richard S. Wise 2011-05-17
7943460 High-K metal gate CMOS Renee T. Mo, Huiming Bu, William K. Henson, Mukesh V. Khare, Vijay Narayanan 2011-05-17
7915115 Method for forming dual high-k metal gate using photoresist mask and structures thereof Rashmi Jha, Naim Moumen, Keith Kwong Hon Wong, Ying H. Tsang 2011-03-29
7872317 Dual metal gate self-aligned integration Alessandro C. Callegari, Bruce B. Doris, Vijay Narayanan, Vamsi K. Paruchuri, Michelle L. Steen 2011-01-18
7871933 Combined stepper and deposition tool Joseph F. Shepard, Jr. 2011-01-18
7863124 Residue free patterned layer formation method applicable to CMOS structures Bruce B. Doris, William K. Henson, Hongwen Yan, Ying Zhang 2011-01-04
7863126 Fabrication of a CMOS structure with a high-k dielectric layer oxidizing an aluminum layer in PFET region Dae-Gyu Park, Vijay Narayanan, Vamsi K. Paruchuri 2011-01-04
7863123 Direct contact between high-κ/metal gate and wiring process flow Huiming Bu, Ricardo A. Donaton, Naim Moumen, Hongwen Yan 2011-01-04