VP

Vamsi K. Paruchuri

IBM: 11 patents #180 of 9,568Top 2%
📍 Mesa, AZ: #1 of 181 inventorsTop 1%
🗺 Arizona: #23 of 2,961 inventorsTop 1%
Overall (2011): #2,561 of 364,097Top 1%
11
Patents 2011

Issued Patents 2011

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
8035173 CMOS transistors with differential oxygen content high-K dielectrics Huiming Bu, Eduard A. Cartier, Bruce B. Doris, Young-Hee Kim, Barry P. Linder +2 more 2011-10-11
8030716 Self-aligned CMOS structure with dual workfunction Dae-Gyu Park, Michael P. Chudzik, Vijay Narayanan 2011-10-04
7999323 Using metal/metal nitride bilayers as gate electrodes in self-aligned aggressively scaled CMOS devices Eduard A. Cartier, Matthew W. Copel, Bruce B. Doris, Rajarao Jammy, Young-Hee Kim +3 more 2011-08-16
7947549 Gate effective-workfunction modification for CMOS Dae-Gyu Park, Michael P. Chudzik, Rashmi Jha, Siddarth A. Krishnan, Naim Moumen +1 more 2011-05-24
7944006 Metal gate electrode stabilization by alloying Veeraraghavan S. Basker, Hariklia Deligianni, Rajarao Jammy, Lubomyr T. Romankiw 2011-05-17
7928514 Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high-k dielectrics Nestor A. Bojarczuk, Cyril Cabral, Jr., Eduard A. Cartier, Matthew W. Copel, Martin M. Frank +4 more 2011-04-19
7919379 Dielectric spacer removal Eduard A. Cartier, Rashmi Jha, Sivananda K. Kanakasabapathy, Xi Li, Renee T. Mo +6 more 2011-04-05
7880243 Simple low power circuit structure with metal gate and high-k dielectric Bruce B. Doris, Eduard A. Cartier, Barry P. Linder, Vijay Narayanan 2011-02-01
7872317 Dual metal gate self-aligned integration Alessandro C. Callegari, Michael P. Chudzik, Bruce B. Doris, Vijay Narayanan, Michelle L. Steen 2011-01-18
7868410 Gate stack engineering by electrochemical processing utilizing through-gate-dielectric current flow Philippe M. Vereecken, Veeraraghavan S. Basker, Cyril Cabral, Jr., Emanuel I. Cooper, Hariklia Deligianni +4 more 2011-01-11
7863126 Fabrication of a CMOS structure with a high-k dielectric layer oxidizing an aluminum layer in PFET region Dae-Gyu Park, Michael P. Chudzik, Vijay Narayanan 2011-01-04