Issued Patents 2011
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8003500 | Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking | Manoj Vellaikal, Kartik Santhanam, Yen B. Ta, Martin A. Hilkene, Matthew D. Scotney-Castle +2 more | 2011-08-23 |
| 7993465 | Electrostatic chuck cleaning during semiconductor substrate processing | Dean Jennings, Jonathon Yancey Simmons | 2011-08-09 |
| 7989329 | Removal of surface dopants from a substrate | Kartik Ramaswamy, Kenneth S. Collins, Biagio Gallo, Hiroji Hanawa, Martin A. Hilkene +2 more | 2011-08-02 |
| 7977199 | Method for measuring dopant concentration during plasma ion implantation | Shijian Li | 2011-07-12 |
| 7968439 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Hiroji Hanawa, Seon-Mee Cho, Biagio Gallo +1 more | 2011-06-28 |
| 7968401 | Reducing photoresist layer degradation in plasma immersion ion implantation | Martin A. Hilkene, Kartik Santhanam, Yen B. Ta, Peter I. Porshnev | 2011-06-28 |
| 7871828 | In-situ dose monitoring using optical emission spectroscopy | Seon-Mee Cho | 2011-01-18 |