Issued Patents 2005
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6953724 | Self-limited metal recess for deep trench metal fill | Nikki Edleman | 2005-10-11 |
| 6903023 | In-situ plasma etch for TERA hard mask materials | Sadanand V. Deshpande, Wendy Yan, Soctt D. Allen, Arpan Mahorowala | 2005-06-07 |
| 6869542 | Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials | Sadanand V. Desphande, David M. Dobuzinsky, Arpan Mahorowala, Tina Wagner | 2005-03-22 |
| 6838347 | Method for reducing line edge roughness of oxide material using chemical oxide removal | Joyce C. Liu, Wesley C. Natzle, Hongwen Yan, Bidan Zhang | 2005-01-04 |