Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6979518 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang +1 more | 2005-12-27 |
| 6903023 | In-situ plasma etch for TERA hard mask materials | Richard S. Wise, Sadanand V. Deshpande, Wendy Yan, Soctt D. Allen | 2005-06-07 |
| 6869542 | Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials | Sadanand V. Desphande, David M. Dobuzinsky, Tina Wagner, Richard S. Wise | 2005-03-22 |
| 6869899 | Lateral-only photoresist trimming for sub-80 nm gate stack | Maheswaran Surendra, Jung Hyuk YOON, Ying Zhang | 2005-03-22 |
| 6849389 | Method to prevent pattern collapse in features etched in sulfur dioxide-containing plasmas | — | 2005-02-01 |